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Sputtering target

Quantity : 1kg   Price : USD1000

CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc. High pure metal sputtering target: Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc. Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services.
Location : Room A-320, Zhongguancun science and technology park， Yongtai middle street 25, Haidian District, Beijing, China., 100192 Beijing,
Contact : Wen Wendy, +86 010 8516 2188

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Sputtering target

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